High Vacuum 3-Inch Three-Target Magnetron Sputtering PVD Coater for Silicon Carbide Film

High Vacuum 3-Inch Three-Target Magnetron Sputtering PVD Coater for Silicon Carbide Film. have 3 magnetron sputter targets, DC power sources apply to metal targets and other conductive targets, and RF power sources are used for non-conductive targets. Power supply can be 200W, 500 W or 1000W according to customer requirements. Vacuum can reach 8*10-5Pa.